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Nano System Solutions Inc maskless photolithography system dl1000a2
Maskless Photolithography System Dl1000a2, supplied by Nano System Solutions Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/maskless+photolithography+system/maskless+photolithography+system+dl1000a2/pm38651281-144-36-40
Average 90 stars, based on 1 article reviews
maskless photolithography system dl1000a2 - by Bioz Stars, 2026-09
90/100 stars

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other:

Article Title: SPIRAL2 Stabilises Endoplasmic Microtubule Minus Ends in the Moss Physcomitrella patens.
Article Snippet: The PDMS mold was fabricated by spin-coating a negative photoresist (SU-8 3025, Microchem Corp) to a thickness of 15 μm on a silicon wafer, followed by photolithography pattering of the desired microchannel layout using maskless photolithography system (DL-1000, Nano System Solutions, Inc).

Produced:

Article Title: Nanoscale Terahertz Monitoring on Multiphase Dynamic Assembly of Nanoparticles under Aqueous Environment
Article Snippet: A photoresist (SS03A9, Dongwoo Fine-Chem, 4000 rpm for 40 s) was evenly spincoated with the aid of a hexamethyldisilazane adhesion promoter (9352-03, J. T. Baker, 2500 rpm for 20 s). .. After annealing at 95 °C for 1 min 30 s, a computer-aided design (CAD) data-loaded maskless photolithography system (DL-1000 HP, Nano System Solutions) produced 500 nm wide nanoslots under exposure to 80 mJ·cm-2 UV light (wavelength of 405 nm). .. Subsequently, the serial process steps of post-annealing at 110 °C for 90 s, rinsing in a developer (AZ300 MIF, AZ Electronic Materials), and hard-baking at 120 °C for 90 s were conducted to arrange the photoresist layer into inverted nanoslot patterns (Figure S1g).



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